Re: Intel

On 16/08/2024 9:18 pm, albert@spenarnc.xs4all.nl wrote:

In article <f4h4bj10ccsmcjsqjasj5hgibhlvu6nq5h@4ax.com>,
John Larkin  <jjlarkin@highlandtechnology.com> wrote:

On Tue, 06 Aug 2024 14:22:51 GMT, Jan Panteltje <alien@comet.invalid>
wrote:
>

On a sunny day (Wed, 7 Aug 2024 00:06:25 +1000) it happened Bill Sloman
<bill.sloman@ieee.org> wrote in <v8tal5$1kdg6$1@dont-email.me>:
>

On 6/08/2024 3:54 pm, Jan Panteltje wrote:

On a sunny day (Mon, 05 Aug 2024 09:30:50 -0700) it happened John Larkin
<jjlarkin@highlandtechnology.com> wrote in
<tuu1bj9bvd05ru71a219scdql4fp0nijq4@4ax.com>:
>

On Mon, 05 Aug 24 16:10:54 UTC, bitrex <user@example.net> wrote:
>

On 8/5/2024 11:26 AM, John Larkin wrote:

On Mon, 05 Aug 24 04:42:24 UTC, bitrex <user@example.net> wrote:
>

On 8/3/2024 5:47 PM, John Larkin wrote:

On Sat, 03 Aug 2024 17:18:33 -0400, Joe Gwinn <joegwinn@comcast.net>
wrote:
>

On Sat, 03 Aug 2024 12:32:23 -0700, John Larkin
<jjlarkin@highlandtechnology.com> wrote:

<snip>

>

What ASML does is likely copied in a short while.

It's not easy to do. or easy to copy.

The Japanese tried EUV and gave up. They seem to be doing OK in DUV.
>
Incidentally, Cymer in San Diego developed the first practical EUV
lithography, and ASML bought it.

 I think EUV is too complicated and there is no path forward from
there. If a new technique is invented, that is probably by the Chinese.

There's nothing particularly complicated about generating extreme ultraviolet light.
It's hard to use it to expose photo-resists on silicon, because the resolution you need and get is lot finer than you can get with longer wavelengths. This makes life difficult in all sorts of ways, so it takes a lot of development, which costs a lot of money, but it makes a lot of money when it works.
--
Bill Sloman, Sydney
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